The number of contaminating particles on a silicon wafer prior to a certain rinsing process was determined for each wafer in a sample of size 100, resulting in the following frequencies:

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The number of contaminating particles on a silicon wafer prior to a certain rinsing process was determined for each wafer in a sample of size 100, resulting in the following frequencies: Number of particles 0 1 2 3 4 5 6 7 8 9 10 11 12 13 14 Frequency 1 2 3 12 11 15 18 10 11 4 5 3 2 2 1 (a) What proportion of the sampled wafers had at least one particle? At least five particles? (Round your answers to two decimal places.) at least one particle
(b) What proportion of the sampled wafers had between five and ten particles, inclusive? Strictly between five and ten particles? (Round your answers to two decimal places.) between five and ten particles, inclusive 0.02

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